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Fields: Applied Mechanics; Industrial Process Measurement and Control; Engineering Design Written for: Research engineers and advanced students in mechanical, aerospace and civil engineering Book category: Monograph Publication language: English Download Table of Contents (PDF: size 636 kb) Strain Review AppMech Review |
Ramesh,
K., Indian Institute of Technology, Kanpur, India Digital PhotoelasticityAdvanced Techniques and Application |
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| ....The
author has produced a first class textbook that should find widespread
use among the students, researchers, and design engineers in many branches
of engineering...... |
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| ......The
book is accompanied by a CD-ROM of the C source code of the programs referred
to in the text along with some photoelasticity simulationsandsomehardware
specific-code...... |
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| ........This is the first monograph in its field and forms a useful contribution....... |
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Code available in CD A straightforward
introduction to basic concepts and methodologies for digital photoelasticity,
providing a foundation on which future researchers and students can develop
their own ideas. The book thus promotes research into the formulation
of problems in digital photoelasticity and the application of these techniques
to industries. Particular care has been taken to give a clear, straightforward,
and simple presentation of various topics. In one volume it provides data
acquisition by DIP techniques, data analysis by statistical techniques,
data presentation by computer graphics and the use of Rapid Prototyping
technologies to enhance the speed of the entire process. The book not
only presents the various techniques but also provides time-tested software
codes for important techniques. Exercises designed to support and extend
the treatment have been placed at the end of each chapter. |
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